Pulsed Laser Deposition PLD-No.1
A PLD system used mainly for depositing thermoelectric thin films. A laser irradiates the target material, depositing a thin film onto the substrate. Deposition is possible under gas or vacuum atmospheres.
A PLD system used mainly for depositing thermoelectric thin films. A laser irradiates the target material, depositing a thin film onto the substrate. Deposition is possible under gas or vacuum atmospheres.
A PLD system used mainly for depositing REBCO thin films. A laser irradiates the target material under an oxygen atmosphere, depositing a thin film onto the substrate.
A PLD system fitted with a glove box so samples can be removed without exposure to air. Performance is identical to PLD-No.2. Samples can be mounted and removed under an Ar atmosphere.
An automatic mixing mortar used when synthesizing bulk REBCO superconductor samples and targets. We currently own two units.
Used to carry out experiments under an inert gas atmosphere.
Used to carry out experiments under an inert gas atmosphere. Our second unit, installed in Room 637.
Used for annealing under an oxygen gas atmosphere.
Used for single-crystal growth by the Bridgman method.
A set of equipment used for sealing quartz tubes.
An electric furnace used for bulk synthesis. Capable of sintering and annealing at temperatures up to about 1000°C.
A large electric furnace used for bulk synthesis and sintering of large samples. We own two units.
A hydraulic press and mold used for target synthesis and similar processes.
A device that applies pressure while heating to produce denser sintered bodies. Used mainly for synthesizing bulk thermoelectric materials.
Used to coat substrates uniformly with thin films. Used for fabricating thin films from solution-based materials.
Used to synthesize thin films by electrochemical methods. Consists of a potentiostat, cell, and a simple glove box.
Capable of evaluating the thermoelectric properties of bulk/thin-film samples.
A cryogenic system used for physical property measurements at low temperatures.
Used for magnetization measurements and critical current density (Jc) evaluation.
Used for electrical resistance and specific heat measurements.
Used to obtain thin-film X-ray and more precise X-ray diffraction patterns.
Used to evaluate the crystal structure of thin-film and bulk samples.
A cluster-type vacuum system linking multiple deposition and processing chambers without exposure to air. Available as a shared NIMS facility.